SAM #W911S227U0002

Army solicitation for a new Agilent 5800-comparable bench-top ICP-OES system

MICC Fort Drum is seeking a new bench-top ICP-OES system, using the Agilent 5800 as its preferred performance benchmark while allowing equivalent systems. - Government buyer: U.S. Department of the Army, Mission and Installation Contracting Command (MICC), Fort Drum. - OEM: Agilent Technologies, Inc. is named as the maker of the Agilent 5800 benchmark system; the solicitation allows equivalent systems. - Requested equipment: One new simultaneous-reading bench-top inductively coupled plasma–optical emission spectrometry (ICP-OES) system. No quantity or specific part number is stated. - Required capabilities include a solid-state detector, dual-view vertical plasma, solid-state RF generator, and mass-flow-controlled plasma gases. - The system must include HF-compatible sample-introduction components, a remotely placeable water chiller, and an autosampler able to hold at least 180 sample positions and 11 standards. - Performance and software requirements: Support aqueous and organic samples, including oils and solvents; satisfy stated EPA detection-limit and CRDL requirements; and analyze specified metal standards within ±10% of certified values. Software must be 64-bit and Windows 11 compatible, with automated interference correction, quality-control functions, raw-data retention, and post-run reprocessing. - Notable conditions: Equipment must be new; refurbished and demonstration units are not acceptable. A one-year parts, labor, and travel warranty is required. The opportunity is set aside for small businesses.

Description

MANDATORY MINIMUM REQUIREMENTS: Preferred instrument: ICP- OES comparable to the Agilent 5800; vendors may offer any equivalent system that meets the required specifications.1. Spectrometer RequirementsSimultaneous reading ICP OES w/ solid state detector.Bench top design only. Floor mount not acceptable.Echelle polychromator, 253 mm focal length, single detector, single entrance slit. Resolution: less than 0.0065 nm @ 200 nm; less than 0.013 nm @ 327.4 nm.Purged + thermostated optical enclosure; purge 0.7 L/min w/ 3 L/min boost option (less than 189 nm).Pixel level anti blooming detector.Vertical plasma; single piece torch. Optional torches must be available.View equal to or greater than 96% emission spectrum from 167-785 nm.Simultaneous UV + Vis determinations in one measurement.2. ICP System RequirementsBench top system; dual view vertical plasma (synchronous axial/radial).Must run aqueous + organic matrices including oil, MIBK, kerosene, hexanes.Monitors gas pressures/flows, water flows, air pressure, exhaust, plasma stability; auto shutdown on interlock breach.Operates at 15-30 degrees C and 25-80% RH; tolerates 2 degrees C/hr change with no performance loss.Exhaust requirement: equal to or greater than 2.5 m^3/min (88 ft^3/min).Power: equal to or less than 2.9 kVA, 200-240 VAC, 50-60 Hz, equal to or less than 15 amps3. Detector RequirementsSingle solid state detector; simultaneous reading of all wavelengths.Peltier cooled to equal to or less than -40 degrees C; Adaptive Integration capability.Hermetically sealed; no gas purge required.4. RF Generator RequirementsSolid state generator, 750-1500 W, 10 W increments.equal to or greater than 75% power transfer efficiency; typical stability 0.1%.5. Gas Flow ControlsAll plasma gases (coolant, auxiliary, nebulizer, makeup) must use mass flow controllers.Must meet flow ranges + increments listed in Government technical criteria.Integrated, computer controlled oxygen addition for organics.6. Sample Introduction SystemCassette style vertical torch; no manual adjustments required after mounting.Double pass glass cyclonic spray chamber + glass concentric nebulizer.Five channel variable speed peristaltic pump; up to 80 rpm.7. Software Requirements64 bit software; Windows 11 compatible.Automated background + spectral interference correction; automatic IEC recalculation.QC system supporting blanks, spikes, duplicates, and corrective actions.Full raw data saving + complete post run reprocessing.8. Performance RequirementsMust meet all EPA ICP OES detection limits and CRDLs using concentric nebulizer + cyclonic spray chamber.9. Additional RequirementsNew instrument; refurbished/demo units not acceptable.One year warranty (parts, labor, travel).Separate, remotely placeable water chiller.Autosampler holding equal to or greater than 180 sample positions + equal to or greater than 11 standards10. Hydrofluoric Acid Compatibility RequirementSample introduction systems must be or include compatible hardware for hydrofluoric acid use. This shall include, at a minimum, an HF-resistant nebulizer and spray chamber11. Certified Metal Standards Accuracy RequirementThe instrument shall be capable of analyzing within +/- 10% of certified values of metal standards (either chip or atomized metal powder) for typical alloy steel grades, typical stainless steel grades, typical copper alloys, typical cast and wrought aluminum, and titanium alloys with proper preparation for metallurgical elements excluding elements atypical of interrogation by ICP-OES methods such as carbon, nitrogen, hydrogen, and oxygen. Additional Links:Department of Defense Procurement ToolboxPIEE Solicitation Module Link for W911S227U0002Registration Instructions for the PIEE Solicitation ModuleWeb Based Training for the PIEE Solicitation Module

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