Opportunity

University of Missouri Ionwave #27-0022

University of Missouri System Solicits Physical Vapor Deposition System for Semiconductor Engineering Program

Posted

August 19, 2026

Respond By

August 27, 2026

Identifier

27-0022

NAICS

333298

The University of Missouri System is seeking bids for a Physical Vapor Deposition (PVD) System to support semiconductor engineering education at Missouri S&T. - Government Buyer: - University of Missouri System, UM Procurement - Contact: Amanda Barnes - Products/Services Requested: - Physical Vapor Deposition System & Accessories - Must process substrates from 1 cm x 1 cm up to 6-inch diameter wafers - Includes turbo and dry vacuum pumps (base pressure ≤ 5E-7 torr) - Three thermal evaporation sources with shutters and power supplies for sequential and co-deposition - Three magnetron sputtering sources for 2-inch or 3-inch targets, including one high-strength source for magnetic materials - Multiple DC and RF power supplies - Gas pressure control with three MFC-controlled process gas lines (O2, N2, Ar) - Three calibrated single crystal deposition rate sensors with film thickness controller - Substrate stage with rotation, backside heating, pneumatic shutter, adjustable source-to-substrate distance - Software/hardware package (if applicable) - Maintenance & service agreement - Training (if applicable) - Installation (if applicable) - Shipping/freight (including duties, fees, tariffs) - Request for best discount - Unique/Notable Requirements: - System will be used in undergraduate cleanroom courses - Suppliers must provide detailed literature for each item - Compliance with University security and authentication requirements (HECVAT, IdP Questionnaire) - Preference for Missouri-based suppliers - Must meet accessibility, health, and security standards - No specific OEMs or vendors are named; qualified manufacturers of PVD systems are encouraged to bid.

Description

The University of Missouri is requesting bids for the furnishing and delivery of a Physical Vapor Deposition System. The system will be used in undergraduate courses offered in the new cleanroom by the Semiconductor Engineering Bachelor's degree program at Missouri S&T. The equipment must meet specific technical requirements including processing substrates up to 6 inches, having multiple evaporation and sputtering sources, and various control features. Qualified suppliers are invited to submit bids through the University of Missouri System's electronic bidding platform by the specified deadline.

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