Opportunity

SAM #NB686090-26-01960_Nitrogen_RF_Plasma_Source

NIST Procurement of Nitrogen RF Plasma Source System for Veeco GEN 10

Buyer

DEPT OF COMMERCE NIST

Posted

July 17, 2026

Respond By

July 24, 2026

Identifier

NB686090-26-01960_Nitrogen_RF_Plasma_Source

NAICS

334519, 334516, 334419, 334413

The National Institute of Standards and Technology (NIST), Physical Measurement Lab, Applied Physics Division, is seeking a nitrogen RF plasma source system for semiconductor research applications. - Government Buyer: - Department of Commerce - National Institute of Standards and Technology (NIST) - Physical Measurement Lab (PML), Applied Physics Division - Products/Equipment Requested: - One (1) Nitrogen RF plasma source compatible with Veeco GEN 10 molecular beam epitaxy system - Features: 4.5 CF flange, water cooling, pyrolytic boron nitride construction, field-replaceable aperture, multi-hole aperture plate, high uniformity over 76 mm substrate, 12.5 inch in-vacuum length, ≤2.09 inch diameter, proven GaN growth rate 0.2–2 m/h, compatible with Molly Software Control, ultrahigh vacuum construction - One (1) RF power supply (600 W max) with cables and interlock circuit for water flow safety - One (1) autotuner for RF load matching - Notable Requirements: - All components must be compatible with the Veeco GEN 10 system - Delivery required within 18 weeks after order receipt (ARO), FOB Destination - Minimum one-year warranty after government acceptance - Equipment supports fabrication of GaN and AlGaN semiconductor layers for metrology research - No specific OEMs or vendors are named in the solicitation - All technical requirements are detailed for compatibility and performance, but no part numbers are provided

Description

Please see attached sources sought documents.

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