Federal Register #2026-14452

Regulatory Relief for Chemical Manufacturing Facilities Under EPA HON Rule

This notice from the Executive Office of the President announces regulatory relief for the American chemical manufacturing sector: - Regulatory relief applies to certain stationary sources in the chemical manufacturing industry - Exempts specific facilities from new emissions-control requirements under the EPA's HON Rule - HON Rule covers New Source Performance Standards for the Synthetic Organic Chemical Manufacturing Industry and National Emission Standards for Hazardous Air Pollutants for the Synthetic Organic Chemical Manufacturing Industry and Group I & II Polymers and Resins Industry - Compliance deadlines for affected facilities are extended by two years - No OEMs, vendors, products, or purchase quantities are specified - Relief is intended to support national security, economic resilience, and prevent disruptions in critical supply chains (energy, defense, agriculture, healthcare)

Description

This notice pertains to regulatory relief measures aimed at promoting security within the American chemical manufacturing sector by providing certain stationary sources with regulatory relief. The document is issued by the Executive Office of the President and was published on July 16, 2026. It addresses exemptions from compliance with certain emissions-control requirements under the HON Rule for a period of 2 years to support national security and economic resilience. The relief is intended to prevent disruptions in chemical manufacturing supply chains critical to various industries and national preparedness.

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