Opportunity

SAM #6-S176-Q-00231-00

Advanced Inductively Coupled Plasma Etching System for Argonne National Laboratory

Buyer

Argonne National Laboratory

Posted

May 15, 2026

Respond By

May 26, 2026

Identifier

6-S176-Q-00231-00

NAICS

334517, 333242, 334516, 334519

Argonne National Laboratory, under the Department of Energy, is soliciting quotations for an advanced Inductively Coupled Plasma (ICP) Etching System to support research in quantum materials, diamond thin films, and advanced device fabrication. - Government Buyer: - Department of Energy, Argonne National Laboratory - Products/Services Requested: - One advanced Inductively Coupled Plasma Etching System with atomic layer etching (ALE) capabilities - Must support ICP-RIE and ALE processes - Accommodate multiple substrate sizes (3-inch, 4-inch, 6-inch, and smaller samples) - Precise substrate thermal control (-20°C to 200°C) - Electrostatic chuck with helium backside cooling - In situ optical monitoring - Compatibility with chlorine-based and other process gases - Turbomolecular pumping (1300 L/s nominal) - Chamber wall heating (~70°C) and dry pumping - Safety interlocks - Services included: - Delivery, installation, and startup by qualified engineers (5 days onsite) - Site acceptance testing (functional and performance verification) - Onsite training (operation, safety, maintenance, troubleshooting, recipe creation) - Documentation, warranty, and spare parts - Unique/Notable Requirements: - System must provide atomic layer etching and support advanced process development - All technical requirements must be met and demonstrated with documentation - Award will be made on a Lowest Price, Technically Acceptable (LPTA) basis - OEMs/Vendors: - No specific OEMs or vendors are named in the solicitation - Place of Performance: - Argonne National Laboratory, Lemont, Illinois

Description

Argonne National Laboratory is seeking quotations for an Inductively Coupled Etching System in accordance with the Statement of Work titled “Q-NEXT Inductively Coupled Etching System,” dated April 27, 2026.

Award will be made on a Lowest Price, Technically Acceptable (LPTA) basis. Vendors must provide sufficient documentation to demonstrate that their proposed system meets all technical requirements of the Statement of Work.

Please submit:

A completed ANL-70 Request for Quotation with pricing and supporting technical evidence A completed ANL-70B Representations and Certificiations

Responses are due no later than 5:00 p.m. CDT on May 26, 2026.

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