Opportunity
Quebec SEAO #C2MI-010324
Wet Etching Equipment for Metals (200mm/300mm Wafer Capable) for C2MI Cleanroom
Posted
March 16, 2026
Respond By
April 21, 2026
Identifier
C2MI-010324
NAICS
333242
C2MI in Bromont, Quebec is initiating a procurement for advanced wet etching equipment for metals, intended for semiconductor manufacturing and research applications. - Government Buyer: - Centre de Collaboration MiQro Innovation (C2MI), Bromont, Quebec - Products/Services Requested: - Wet etching equipment for metals - Must process both 200mm and 300mm wafers - Minimal adjustment time required for switching wafer sizes - Suitable for RCA cleaning and diluted hydrofluoric acid (dHF) on non-structured wafers - Installation in ISO 4 and ISO 6 cleanroom environments - Unique/Notable Requirements: - Bidders must have a permanent establishment in Quebec, England, Australia, the United States, Japan, or a territory covered by an Intergovernmental Agreement - Valid certificate from Revenu Québec regarding fiscal obligations - Proven history of satisfactory performance - One-time purchase; contract duration extends to end of service contract - No specific OEMs or vendors are named in the solicitation - Place of performance is the C2MI facility in Bromont, Quebec
Description
The Centre de Collaboration MiQro Innovation (C2MI) is seeking to procure a wet etching equipment for metals capable of processing 200mm and 300mm wafers, with minimal adjustment time for 200mm wafers. The system will be installed in a cleanroom environment and must handle RCA cleaning and diluted hydrofluoric acid for non-structured wafers. The procurement is a one-time purchase with specific conditions regarding bidder establishment and fiscal compliance. The contract duration extends up to the end of the service contract.