# University of Missouri Ionwave #27-0044

Missouri S&T Solicits One PECVD System for Semiconductor Engineering Training

**Posted:** October 07, 2026
**Respond By:** October 21, 2026
**Identifier:** 27-0044
**NAICS:** 333242, 423490

The University of Missouri is seeking one PECVD system to support Missouri S&T semiconductor engineering instruction and cleanroom training.
- **Buyer:** University of Missouri, Missouri University of Science and Technology (Missouri S&T), UM Procurement.
- **Requested equipment:** One Plasma Enhanced Chemical Vapor Deposition (PECVD) system; no OEM, manufacturer, model, or vendor is specified.
  - Must handle substrates from 1 cm × 1 cm pieces through 6-inch wafers and deposit silicon dioxide and silicon nitride films.
  - Required features include a vacuum load-lock, 208 VAC power, temperature-controlled substrate and upper electrode, a chiller and reactor-body heating, an RF generator rated at least 300 W, and an LF generator for stress control.
  - Vacuum and gas systems must include a corrosive-gas-resistant dry foreline pump, a turbo-molecular pump, and six MFC-controlled process-gas lines for argon, oxygen, nitrogen, silane, and spare lines, with gas pods. An endpoint detection system is also required.
  - A 24-month warranty is required, and bidders must provide detailed product literature and specifications.
- **Other requested items and options:** One optional software/hardware line; optional maintenance/service agreement, training, installation, and shipping/freight, including applicable tariffs, duties, and fees.
- **Period:** Two years from award, with firm pricing during the initial term. The system warranty is 24 months.
- **Estimated value:** Approximately $200,000–$600,000; this is an analytical estimate, not a stated solicitation value.

### Description

The University of Missouri requests bids for the furnishing and delivery of one Plasma Enhanced Chemical Vapor Deposition (PECVD) system for use in undergraduate courses in the new Semiconductor Engineering bachelor’s degree program at Missouri S&T. The system must meet specifications including processing substrates from 1 cm pieces to 6-inch wafers, depositing silicon dioxide and silicon nitride films, and including specified vacuum, temperature-management, gas-control, detection, and power components. A 24-month warranty is required, and bidders must provide detailed product literature. The contract period is two years from award, with pricing firm for the initial term; bids must be submitted through the University’s electronic bidding platform by October 21, 2026.

[View original listing](https://umsystembids.ionwave.net/PublicDetail.aspx?bidID=1044&SourceType=1)